Swiss Cluster designs and manufactures compact ALD/PVD cluster tools that combine atomic layer deposition and physical vapor deposition without breaking vacuum, enabling the creation of complex nanolaminate coatings directly in research labs. Their modular hardware supports variable chamber sizes, custom tool adaptations, and integration of in‑situ metrology, while their thin‑film development service translates custom material specifications into repeatable, pilot‑scale deposition processes for faster scale‑up.
Funding
Funding not disclosed
Founders
Product
Problem
Researchers and manufacturers of advanced coatings often need to create complex nanolaminate structures that combine atomic layer deposition (ALD) and physical vapor deposition (PVD) steps. Switching between separate ALD and PVD tools requires breaking vacuum, which can cause interfacial oxidation and disrupt film continuity, leading to lower performance and longer development cycles.
Solution
Swiss Cluster provides integrated ALD/PVD cluster systems that combine both deposition techniques within a single vacuum environment, eliminating vacuum breaks and preventing interfacial oxidation. The modular hardware can be configured with variable chamber sizes and accommodates custom tool adaptations, allowing users to scale from laboratory batches to pilot‑scale production. In‑situ metrology instruments can be directly integrated, enabling real‑time monitoring and precise control of film thickness and composition. The company also offers thin‑film development services to translate custom material specifications into repeatable deposition processes, handling early‑stage testing and pilot‑scale manufacturing on behalf of customers. By delivering industrial‑grade hardware and process expertise, Swiss Cluster helps accelerate the transition of complex 2D and 3D coatings to high‑volume manufacturing.
Target Audience
Primary customers are R&D laboratories, semiconductor and advanced materials manufacturers, and thin‑film coating companies that require seamless ALD/PVD processes for complex nanolaminates.
Features
- Integrated ALD and PVD modules that operate without breaking vacuum, ensuring oxidation‑free interfaces
- Modular chamber architecture supporting a range of sizes and custom tool attachments for flexible scaling
- Direct integration points for multiple in‑situ metrology tools (e.g., ellipsometry, mass spectrometry) for real‑time process feedback
- Compact cluster design suitable for research labs while providing industrial‑level process continuity
- Thin‑film development service that converts bespoke material requirements into repeatable pilot‑scale deposition recipes
- Engineered in Switzerland with a focus on precision hardware and robust process parameters for high‑volume production readiness