SCIL Nanoimprint Solutions utilizes Substrate Conformal Imprint Lithography (SCIL) to achieve high-resolution patterning of nano-structures on various substrates, ensuring nanometer precision at scale. This technology addresses the need for cost-effective and robust manufacturing processes in industries requiring advanced nano-patterning capabilities.
Funding
$10.9M raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
IXFounders
Product
Problem
Many industries require high-resolution nanopatterning for advanced applications, but existing manufacturing processes often lack the necessary precision, scalability, and cost-effectiveness. Achieving nanometer-scale accuracy on diverse substrates remains a significant challenge.
Solution
SCIL Nanoimprint Solutions offers Substrate Conformal Imprint Lithography (SCIL), a proprietary technology for high-resolution nanopatterning. SCIL enables nanometer-scale precision on a variety of substrates through a cost-effective and robust process. The company provides a range of equipment, including manual and fully automated systems, to support R&D, pilot production, and high-volume manufacturing. SCIL also offers a selection of consumables, such as inorganic nanoimprint resists with tunable refractive indices, and provides process support through its application center.
Target Audience
The primary customers include research institutes, manufacturers, and startups in industries requiring advanced nanopatterning, such as optics, semiconductors, and biotechnology.
Features
- Substrate Conformal Imprint Lithography (SCIL) technology for high-resolution nanopatterning
- Equipment options ranging from manual (LabSCIL) to fully automated (AutoSCIL, FabSCIL Cluster) systems
- Stamp making tools (SMT200, SMT300) for creating nanoimprint stamps
- Inorganic nanoimprint resists with flexible curing options (temperature or UV)
- Resists with tunable refractive index (1.17 to 1.96) suitable for optical applications
- SCIL Application Center equipped with SEM and metrology tools for process development and characterization
- Pilot production capabilities for up to 500 imprints per stamp