Phosio develops transparent, UV-curable metal oxide precursors for low-temperature solution-based deposition. These PhosioLux® products enable rapid, cost-effective patterning for advanced optical components in displays, semiconductors, and AR devices. The platform simplifies manufacturing processes, allowing for high-performance, lightweight electronics compatible with flexible substrates.
Funding
$400K raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
Founders
Product
Problem
The fabrication of advanced nanostructures and optical coatings often requires high-temperature processes and specialized materials, increasing manufacturing costs and limiting design flexibility. Existing sol-gel methods and atomic layer deposition (ALD) techniques can be slow, expensive, and may not be suitable for all substrate types.
Solution
Phosio Corporation develops UV-curable metal oxide precursors and low-temperature deposition processes that enable the cost-effective manufacturing of high aspect ratio nanostructures and optical coatings. Their PhosioLux® products are compatible with solution-based deposition techniques like spin coating, slot die coating, and ink jetting, allowing for rapid deposition at temperatures as low as 150°C. These materials can be patterned using direct UV exposure or nanoimprint lithography (NIL), providing precise control over film properties and enabling the creation of robust, high-refractive-index components. Phosio's technology improves display brightness and enables smaller augmented reality devices with better image quality.
Target Audience
Phosio's primary customers are manufacturers of semiconductors, augmented reality devices, OLED and MicroLED displays, lidar systems, and biochips.
Features
- UV-curable metal oxide precursors for low-temperature deposition (down to 150°C)
- Compatibility with spin coating, slot die coating, and ink jetting deposition methods
- Patterning via direct UV exposure or nanoimprint lithography (NIL)
- Tunable refractive index (1.30 ≤ n ≤ 2.35) through precursor design
- Negligible absorption and very low haze in resulting films
- Superior thermal and chemical stability due to inorganic material composition
- Capability to thicken metal oxide films for MicroLED and OLED encapsulation