LayTec provides in-situ and in-line metrology solutions for real-time monitoring of thin-film deposition processes. Their systems offer precise control over epitaxy, ALD, and sputtering, enabling manufacturers to improve film quality and production yields in optoelectronics and photovoltaics.
Funding
Funding not disclosed
Founders
Product
Problem
The fabrication of advanced thin films, crucial for optoelectronics and photovoltaics, requires precise control over deposition processes like epitaxy, ALD, and sputtering. Inadequate real-time monitoring leads to variations in film quality, reduced production yields, and extended development cycles.
Solution
LayTec provides integrated metrology solutions designed for in-situ and in-line monitoring of thin-film deposition processes. Their systems utilize advanced optical and physical measurement techniques to provide real-time data on film growth, temperature, and structural properties. This enables manufacturers to achieve tighter process control, optimize film quality, and accelerate the development of new materials and device architectures. By offering insights directly within the deposition environment, LayTec's technology facilitates immediate process adjustments, leading to improved consistency and reduced waste.
Target Audience
LayTec serves manufacturers and researchers in the optoelectronics, power electronics, photovoltaics, and display industries who require precise control over thin-film deposition processes.
Features
- **In-situ Metrology Systems:** Employing techniques such as 3λ reflectance, IR pyrometry, UV pyrometry, and Reflectance Anisotropy Spectroscopy (RAS) for real-time monitoring of epitaxy and other deposition processes.
- **In-line Metrology Systems:** Offering solutions like ILMetro and X Link for post-deposition analysis, enabling quality control at various stages of the manufacturing line.
- **Wafer Bow Measurement:** Utilizing EpiCurve® TT technology to monitor wafer curvature during deposition, critical for stress management in thin films.
- **Advanced Process Control (APC) Integration:** Providing tools and algorithms for fault detection and run-to-run control, facilitating automated process optimization.
- **Connected Metrology Framework:** Enabling data aggregation and analysis across multiple metrology tools and manufacturing steps for comprehensive process understanding.
- **Software Solutions (EpiNet):** Offering data analysis, visualization, and reporting capabilities to interpret metrology data and support process development.
- **Material-Specific Solutions:** Tailored metrology approaches for III-Nitride, InP, GaAs, and various photovoltaic materials (c-Si, CIGS, CdTe, Perovskites).