The startup develops a machine for high-volume spatial atomic layer deposition using super spatial precursor separation technology, which significantly enhances throughput and uptime. This technology enables manufacturers to efficiently integrate atomic layer deposition into their production processes, reducing costs and increasing scalability.
Funding
$4.4M raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
Founders
Product
Problem
Traditional Atomic Layer Deposition (ALD) methods for thin film coatings on large, flexible substrates suffer from slow production speeds and high costs, hindering their widespread industrial adoption. Existing spatial ALD technologies often require a large footprint and struggle with maintaining sufficient gas separation, leading to contamination and reduced uptime.
Solution
Kalpana Systems offers a high-throughput spatial ALD solution that makes nanocoatings on large and flexible substrates commercially viable. Their "Superspatial ALD" technology utilizes a novel helical design with a rotating deposition head to deposit thin films with atomic precision at significantly faster speeds than conventional ALD processes. This approach ensures good gas separation, minimizes contamination, and maximizes uptime, enabling the production of high-quality, uniform, and conformal layers on a variety of materials. The system's design allows for easy integration into existing production lines, reducing costs and increasing scalability for applications in batteries, solar PV, OLED displays, and packaging.
Target Audience
Kalpana Systems targets manufacturers of batteries, flexible solar cells, OLED displays, and packaging materials who require high-throughput, cost-effective nanocoating solutions.
Features
- Helical web transport system for continuous roll-to-roll processing of flexible substrates
- Rotating deposition head with separate gas segments and inert gas curtains for precise precursor control and gas separation
- Capability to deposit complex multi-layer thin films in a single process
- Operation at atmospheric pressure and low temperatures, reducing energy consumption
- High precursor utilization, minimizing material waste
- Compact system footprint compared to traditional spatial ALD equipment
- Compatibility with a wide range of web materials and widths