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Innovation Semiconductor

The startup manufactures monolithic micro-light-emitting diode (LED) displays that integrate LED elements and driving transistors within each nanowire, utilizing a thin film transistor backplane and conventional semiconductor processing. This technology enables businesses to achieve higher pixel density and power efficiency, resulting in displays with enhanced resolution and design flexibility.

Rochester, United StatesFounded 2019350+ followers
Updated 3 months ago

Funding

$600K raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.

Funding rounds are not available yet.

Founders

Product

Problem

Current micro-LED display manufacturing faces challenges in achieving high pixel density, efficient power consumption, and flexible design, particularly for applications like augmented reality (AR) and wearable devices. Traditional methods often struggle with limitations in image resolution, brightness consistency, and heat generation.

Solution

Innovation Semiconductor provides monolithic micro-LED displays that integrate LED elements and driving transistors within a single-crystal Gallium Nitride (GaN) material system. This unified vertical architecture enables ultra-high resolution, enhanced power efficiency, and faster switching speeds. Their color-tunable LEDs, with laterally-variable color formation, reduce defects and enhance display performance, allowing a single LED to generate a full spectrum of colors. By using conventional semiconductor processing, Innovation Semiconductor eliminates issues associated with mass LED transfer, resulting in displays with unmatched performance and design potential.

Target Audience

The primary target audience includes manufacturers of augmented reality (AR) devices, wearable technology, and other display products seeking high-performance, energy-efficient micro-LED solutions.

Features

  • Monolithic, single-crystal GaN vertical architecture for integrated LEDs and transistors
  • Color-tunable LEDs with laterally-variable color formation, enabling a full range of emission from a single LED pixel
  • LED diameters down to 2 microns and subpixel spacing down to 4 microns
  • Increased power efficiency, reducing heat generation without sacrificing brightness
  • Simplified integration with single-wafer fabrication and optional on-display-chip control electronics
  • Improved LED emission through a proprietary GaN semiconductor stack, enhancing on-axis light emission
  • High brightness (more than 1M nits qVGA) with consistent luminance across the entire LED array (less than 5% variability)
  • High operating temperature stability (greater than 175°C)
This profile is AI-generated and may contain inaccuracies.