In2great Materials provides a wafer‑scale integration platform that deposits and patterns 2D crystals using existing CVD/ALD reactors and standard photolithography, allowing semiconductor fabs to add graphene, transition‑metal dichalcogenides and other 2D layers without new equipment or process disruption. The offering includes in‑line metrology and a cloud‑based SaaS dashboard that delivers real‑time uniformity, defect and yield analytics while meeting cleanroom contamination standards.
Funding
Funding not disclosed
Founders
Product
Problem
Semiconductor manufacturers lack a scalable, low‑risk method to incorporate atomically thin 2D materials into existing production lines. Conventional integration approaches require dedicated equipment or exotic precursors, which drives up cost and disrupts established fab workflows. Consequently, the performance benefits of 2D layers remain inaccessible for high‑volume sensing, photonic, and electronic devices.
Solution
In2great Materials delivers a process‑compatible integration platform that enables wafer‑scale deposition and patterning of 2D crystals using only the tools and chemicals already qualified in modern foundries. The technology leverages standard chemical‑vapor‑deposition (CVD) reactors, atomic‑layer‑deposition (ALD) modules, and conventional photolithography to transfer and align 2D sheets with sub‑nanometer thickness control. By adhering to existing contamination‑control protocols and temperature budgets, the solution minimizes cycle‑time impact and avoids additional capital expenditure. The resulting stack can be directly incorporated into CMOS‑based sensor, photonic, and electronic architectures, delivering the targeted functional enhancements without compromising fab yield. A cloud‑enabled analytics suite monitors film uniformity, defect density, and interface quality in real time, providing process engineers with actionable feedback for continuous optimization.
Target Audience
The primary customers are semiconductor foundries and fab‑integrated device manufacturers developing advanced sensors, photonic components, and next‑generation electronic products that require 2D material functionality. Additionally, R&D divisions of large‑scale electronics firms seeking a production‑ready path to 2D integration are a key market segment.
Features
- Wafer‑scale CVD/ALD workflow that deposits graphene, transition‑metal dichalcogenides, and other 2D crystals on 200 mm/300 mm substrates
- Compatibility with standard cleanroom chemicals and temperature windows (< 450 °C) to preserve existing device layers
- Integrated transfer‑free patterning using conventional photolithography and dry‑etch steps, eliminating manual handling of fragile flakes
- In‑line metrology module (Raman spectroscopy, ellipsometry) for thickness and strain mapping with < 5 nm resolution
- Automated defect detection and yield analytics delivered via a secure SaaS dashboard, supporting SPC and DOE methodologies
- Full compliance with semiconductor contamination standards (ISO‑14644, IEST‑Q100) and material traceability across lot numbers
- API hooks for seamless data exchange with fab MES and recipe management systems