Bodun Optoelectronics designs and manufactures high-performance ion sources and ion beam equipment, specializing in ion beam sputtering, etching, and polishing technologies for precision micro-nano fabrication. The company addresses the need for reliable, domestically produced solutions in the optical, aerospace, and semiconductor industries, enhancing production efficiency and material quality.
Funding
Funding not disclosed
Founders
Product
Problem
Industries such as optical, aerospace, and semiconductor manufacturing require high-performance ion sources and ion beam equipment for precision micro-nano fabrication, but often face challenges in sourcing reliable, domestically produced solutions. This dependence on foreign suppliers can lead to supply chain vulnerabilities and hinder production efficiency.
Solution
Bodun Optoelectronics designs and manufactures fully controllable, domestic ion beam equipment and process solutions, specializing in ion beam sputtering, etching, and polishing technologies. Their equipment enhances production efficiency and material quality by providing reliable solutions for precision micro-nano fabrication. Bodun Optoelectronics' core technology addresses critical bottlenecks in the optical, aerospace, semiconductor, and other strategic emerging industries by offering domestically produced, high-performance ion sources and ion beam micro-nano processing equipment.
Target Audience
The primary customers are in the optical, aerospace, semiconductor, optical communication, and new energy industries requiring advanced ion beam technology for precision manufacturing and R&D.
Features
- IBS (Ion Beam Sputtering) equipment for multi-layer nano thin film deposition, offering high film density, strong adhesion, material versatility, and minimal contamination.
- IAD (Ion Beam Assisted Deposition) equipment for optical coating, providing a cost-effective, automated production solution.
- IBE/RIBE (Reactive Ion Beam Etching) equipment supporting nano-linewidth precision and high aspect ratio etching, independent of material type, with high collimation, etch rate, and repeatability.
- Ion beam polishing equipment for ultra-high precision non-contact shaping and polishing of large-area, special-shaped, and unique materials, achieving sub-nanometer accuracy.
- Non-filament Hall ion sources featuring patented neutralizers.
- Cluster-type semiconductor equipment solutions.