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Hexisense

Hexisense develops gas sensors for vacuum systems utilizing gallium nitride semiconductor technology, enabling precise detection of residual gases down to part-per-billion levels. Their compact sensors provide real-time pressure measurements across a wide range of process pressures, eliminating the need for differential pumping in high-vacuum environments.

Ecublens, SwitzerlandFounded 20192300+ followers
Updated 4 months ago

Funding

$300K raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.

Funding rounds are not available yet.

Founders

Product

Problem

In semiconductor manufacturing and other high-vacuum processes, accurately detecting residual gases is crucial for process control and yield optimization. Existing gas detection methods often require differential pumping or are not sensitive enough to detect trace gases at part-per-billion levels, especially across a wide range of process pressures.

Solution

Hexisense provides compact gas sensors for vacuum systems based on gallium nitride (GaN) semiconductor technology. These sensors enable real-time, in-situ detection of residual gases down to part-per-billion levels without the need for differential pumping. The sensors offer precise pressure measurements across a broad range of process pressures, from hundreds of atmospheres to high vacuum, facilitating improved process monitoring and control. The design incorporates all-metal vacuum seals, an ISO-KF vacuum flange, and SEMI-standard EtherCAT communication for easy integration.

Target Audience

The primary target audience includes manufacturers and researchers in the semiconductor, aerospace, and related industries who require precise residual gas analysis in vacuum environments.

Features

  • GaN-based microtechnology for physical detection of residual gases
  • Detection of total pressure and residual gas in a pure gas background down to ppb levels
  • Wide operating pressure range, from hundreds of atmospheres to high vacuum
  • All-metal vacuum seals and ISO-KF vacuum flange for robust integration
  • SEMI-standard EtherCAT communication interface
  • Compact form factor for point-of-process measurement
  • Corrosion-resistant nitride semiconductor platform
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