Cnuic Technologies provides optical lithography systems that replace traditional photomasks with programmable virtual masks generated by high‑resolution spatial light modulators. The platform enables real‑time pattern updates and iterative exposure, reducing mask costs and lead‑time while delivering sub‑100 nm feature resolution for semiconductor, photonics, and research applications.
Funding
€3M raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
Founders
Product
Problem
Traditional photolithography relies on physical photomasks, which are expensive to produce, time‑consuming to change, and limit design flexibility for nanoscale manufacturing. This creates bottlenecks in precision engineering, especially for low‑volume or rapidly iterated production runs.
Solution
Cnuic Technologies is creating next‑generation optical lithography systems that replace static photomasks with dynamically generated virtual masks. By projecting programmable light patterns directly onto wafers, the platform enables rapid design changes without the need for new mask fabrication. The system leverages high‑resolution spatial light modulators and advanced wavefront control to achieve nanoscale feature definition comparable to conventional mask‑based processes. Integrated software defines pattern geometry in real time, allowing on‑the‑fly adjustments and iterative optimization during a single exposure. This approach reduces mask costs, shortens time‑to‑market, and expands the capability of precision manufacturing for emerging nanotechnologies.
Target Audience
Primary customers are semiconductor fabs, photonics manufacturers, and research labs engaged in nanoscale device fabrication that require flexible, high‑precision lithography solutions.
Features
- Programmable spatial light modulator creates virtual mask patterns with sub‑100 nm resolution
- Real‑time wavefront shaping and adaptive optics ensure precise focus and pattern fidelity across the wafer
- Software‑defined pattern generation supports instant design updates and iterative exposure cycles
- Elimination of physical photomasks lowers material costs and eliminates lead‑time for mask production
- Scalable architecture compatible with existing wafer handling and exposure infrastructure