The startup develops environmentally sustainable planarization pads that eliminate abrasives in the semiconductor polishing process by utilizing chemical reactions to achieve planarity. This technology reduces process steps and enhances throughput for semiconductor manufacturers, addressing inefficiencies in traditional planarization methods.
Funding
$5.4M raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
Founders
Product
Problem
Traditional chemical mechanical planarization (CMP) methods in semiconductor manufacturing rely on abrasive slurries, leading to defects, high wastewater disposal costs, and complex slurry management. These inefficiencies reduce chip yields and increase operational expenses for semiconductor manufacturers.
Solution
ChEmpower provides environmentally sustainable planarization pads that eliminate the need for abrasive slurries in semiconductor polishing. Their technology utilizes proprietary chemistry-empowered, functional pads that replace both the traditional pad and slurry, achieving planarity through chemical reactions. This abrasive-free planarization process reduces defects, increases chip yields, and minimizes wastewater, offering a comprehensive solution for advanced semiconductor manufacturing. The pads are designed to seamlessly integrate into existing CMP systems, providing a drop-in replacement for current consumables.
Target Audience
ChEmpower's primary customers are semiconductor manufacturers focused on advanced chip manufacturing processes.
Features
- Abrasive-free planarization process eliminating slurry usage
- Chemistry-empowered functional pads with tunable material removal rates
- In-situ grooving during manufacturing for high-quality pad production
- Seamless integration with existing CMP systems
- Reduced wastewater disposal and slurry management costs
- Scalable technology platform extendable to new materials
- Increased chip yields due to lower defect rates