Amec Inc. designs and manufactures advanced semiconductor processing equipment, including plasma dry‑etch systems, MOCVD reactors, and thin‑film deposition tools, all optimized for high uniformity and low defect rates. The company also provides air‑purification and waste‑gas treatment solutions to meet strict environmental regulations, backed by global after‑sales support, spare‑part logistics, and integrated process‑control software.
Funding
$2.8M raised to dateRaised to date based on public sources. This may differ from the amount the company actually raised and is based only on what is publicly available on the internet.
SGFounders
Product
Problem
Semiconductor manufacturers require highly precise, high‑throughput equipment for wafer patterning, thin‑film deposition, and material growth, while also needing to control emissions from complex chemical processes. Traditional solutions can be limited in scalability, integration, and environmental compliance.
Solution
Amec Inc. develops and supplies a portfolio of advanced semiconductor processing tools, including plasma dry‑etch systems, metal‑organic chemical vapor deposition (MOCVD) reactors, and thin‑film deposition equipment. The company also offers dedicated air‑purification and waste‑gas treatment units to meet strict environmental standards. Its products are engineered for high uniformity, low defectivity, and flexible integration into existing fab lines. Amec provides global after‑sales support, spare‑part management, and technical services to ensure uptime and rapid technology adoption across multiple sites.
Target Audience
Primary customers are semiconductor foundries, integrated device manufacturers, and research laboratories that require high‑precision wafer processing and compliant environmental control solutions.
Features
- Primo series plasma etch platforms (e.g., D‑RIE®, AD‑RIE®, SSC AD‑RIE®, iDEA®, HD‑RIE®, TSV®, nanova®, Twin‑Star®, UD‑RIE®) delivering high selectivity and precise profile control.
- PRISMO MOCVD family (D‑BLUE®, A7®, HiT3®, UniMax®) enabling uniform epitaxial growth of compound semiconductors with advanced gas‑flow and temperature management.
- Preforma thin‑film lines (Uniflash® TiAl, TaN, TiN; Uniflex® AW, HW, CW) for reliable metal and dielectric coating with tight thickness tolerance.
- VOC purification, plasma‑based waste‑gas treatment, and combustion‑water‑wash systems that capture and neutralize hazardous emissions from semiconductor processes.
- Integrated control software and diagnostics for real‑time process monitoring, recipe management, and predictive maintenance.
- Worldwide service network and on‑site spare‑part logistics to minimize equipment downtime.